Description
- Model: APEX3013 3156114-746
- Brand: AE (Advanced Energy)
- Series: AE APEX Series RF Plasma Generator
- Core Function: Provide stable RF power for plasma processes
- Type: RF Plasma Generator
- Basic Introduction: High-performance 3kW RF generator for industrial plasma processing applications.
- Key Application: Deliver stable RF energy for semiconductor and surface treatment processes.
- System Compatibility: Seamlessly integrates with AMAT (Applied Materials) equipment and industrial control systems.
APEX3013 3156114-746
Product Specifications
- Model: APEX3013 3156114-746
- Type: RF Plasma Generator
- Brand: AE (Advanced Energy)
- Series: AE APEX Series RF Plasma Generator
- Output Power: 3000 W (3 kW)
- Operating Frequency: 13.56 MHz (fixed frequency)
- Power Supply: 208 VAC (typical, wide voltage range optional)
- Efficiency: High efficiency with low power loss
- Control Mode: Digital control architecture for precise power regulation
- Operating Temperature: 0°C to 40°C
- Storage Temperature: -20°C to +60°C
- Protection Class: IP20 (industrial control cabinet mounting)
- Weight: Approx. 15 kg (33.07 lbs)
- Dimensions: Compact modular design, suitable for limited space installation
- Certifications: CE, RoHS
Product Features
- Stable Power Output: 3kW fixed power output with high stability for consistent plasma processes.
- Fixed Frequency Operation: 13.56 MHz standard frequency, ideal for plasma etching and deposition.
- Modular Design: Compact and modular structure, easy to install, maintain and replace.
- Digital Control: Advanced digital control architecture for precise power regulation and process repeatability.
- High Efficiency: Optimized circuit design ensures high energy efficiency and low power loss.
- Strong Compatibility: Perfectly integrates with AMAT equipment and various industrial control systems.
- Space-Saving: Compact size allows easy installation in tight control cabinet spaces.
- Reliable Performance: Industrial-grade components ensure stable operation in harsh industrial environments.
- Self-Diagnosis Function: Built-in self-diagnostic system for quick fault detection and troubleshooting.
- Process Stability: Ensures consistent plasma performance, improving production process stability and product quality.
Product Uses
- RF Power Supply: Provide stable 3kW RF energy for plasma generation in industrial processes.
- Plasma Etching: Support semiconductor wafer etching processes with precise power control.
- Plasma Deposition: Enable thin film deposition processes in semiconductor and optical industries.
- Surface Treatment: Facilitate material surface modification and cleaning via plasma technology.
- System Integration: Integrate with AMAT and other industrial equipment for automated production.
- Process Control: Ensure repeatability and stability of plasma processes for high-quality production.
- Fault Monitoring: Built-in self-diagnosis to monitor equipment status and reduce downtime.
Application Fields
- Semiconductor Industry: Semiconductor wafer etching, thin film deposition and microfabrication processes.
- Optical Industry: Optical component surface treatment and thin film coating.
- Electronics Manufacturing: Printed circuit board (PCB) processing and microelectronic component production.
- Material Science: Material surface modification, cleaning and functional coating.
- Flat Panel Display: Flat panel display manufacturing and plasma processing.
- Industrial Automation: Automated production lines requiring stable RF plasma power supply.
- Microelectronics: Precision microelectronic component processing and packaging.
- Renewable Energy: Solar cell manufacturing and surface treatment processes.
